Chemical Equipment

Wafer Cleaning System

This automated wet bench system features multiple process baths integrated with rinse baths (QDR, QD, F/R) and an overhead transfer robot for wafer and cassette handling. It performs high-efficiency cleaning and etching processes on semiconductor wafers utilizing specialized chemical solutions.

Key Features

• Excellent Process Performance: Supports a wide range of customizable process recipes

• Maintenance Convenience: Equipment architecture engineered to maximize serviceability and operational efficiency

• User-Friendly Interface: Operator-centric layout with an intuitive HMI/UI environment

Application Fields

  • RCA Cleaning Process: Standard semiconductor chemical cleaning technology designed to eliminate organic, oxide, and ionic contaminants
  • Precision Film & Contaminant Removal: High-precision selective removal of particles, nitrides, oxides, and polymer residues
  • Photoresist (PR) Strip Station: High-performance stripping and cleaning process to reliably eliminate residual photoresist after lithography

Main Products

  • Auto&Semi Auto Wet Station

  • Dryer